均匀静电场偏转系统的几何象差的计算
CALCULATION FOR GEOMETRICAL ABERRATIONS OF A DEFLECTION SYSTEM WITH A UNIFORM ELECTROSTATIC FIELD
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摘要: 本文从电子在理想均匀静电场中的运动方程出发,推导出了三级几何象差的公式。所得结果不但可用来估算点束或成形束的畸变、象散、和场曲彗差量,而且可用来选择偏转器的初始尺寸和确定对中偏差所造成的影响。本文还指出了前人工作中存在的一些错误。
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Abstract: In this paper, formulas of third geometrical deflection aberratios for an ideal uniform electrostatic field are deritved by solving the motion equations of an electron passing through this field. The results can be used not only to estimate the distortion, astigamatism and field curvature, and coma produced by a Gaussian or shaped electron beam, but also to set the original size of the deflector and determine the effect caused by the misaligument between the electron beam and the deflector. Some mistakes in Sturrock's paper (1955) are also poited out. -
J. Kelly, T, Groves and H. P. Kuo, A High-Current, High Specd Electron Beam Lithography Column, Proceedings of the 16th Symposium on Electron, Ion, and Photon Beam Technology, Dallas,Texas, May 26-29, 1981, p. 936.[2] H. C. Chu and E. Munro, Computational Techniques for Designing Electron Beam Lithography System Containing Any Combination of Electrostatic and Magnetic Lenses and Deflectors, Proceedings of the 6th International Conference on Microlithography, Delft University, Amsterdam 1981, p. 19.[3] P. A. Sturrock, Static and Dynamic Electron Optics, Cambridge University Press, 1955, p. 146.[2]Hilary Moss, Narrow Angle Electron Guns and Cathode Ray Tubes, Academic Press, New York, 1968.[3]西门纪业,电子和离子光学原理及象差导论,科学出版社,1983, p.49. -
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