Discussion on the Key Technique of Millimeter-wave Radar Front-end
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摘要: 毫米波雷达的距离分辨率和最大可工作距离通常受雷达射频信号带宽和发射功率的限制,具有宽工作带宽、高输出功率、高灵敏度、高精度相位控制的毫米波雷达芯片是实现高性能毫米波雷达系统的关键。毫米波雷达芯片的设计难点主要集中在阻抗匹配、噪声降低、功率提升、相位控制等方面。因此,该文针对毫米波雷达前端芯片设计难点的关键解决技术进行探讨和综述。Abstract: The range resolution and maximum working distance of millimeter-wave radar are usually limited by the RF bandwidth and transmitted power. Millimeter-wave radar front-end chip with wide bandwidth, high transmitted power, high sensitivity and high-precision phase control is crucial to millimeter-wave radar system to achieve high performance. The difficulties of millimeter-wave radar chips mainly focus on impedance matching, noise reduction, transmitted power increase, phase control, etc. Therefore, this article discusses and summarizes the key technique to solution the difficulties of millimeter-wave radar front-end chips.
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Key words:
- Millimeter-wave radar /
- Chip /
- Impedance matching /
- Power combination /
- Phased-array
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图 5 3种功率放大器基本结构对比[51]
图 6 4种功率合成结构对比[56]
表 1 宽带毫米波低噪声放大器性能对比
文献序号 [23] [25] [31] [36] [37] [38] [44] [50] 工艺 40 nm
CMOS0.13 μm
SiGe BiCMOS0.13 μm
SiGe BiCMOS65 nm
CMOS65 nm
CMOS65 nm
CMOS28 nm
CMOS65 nm
CMOS匹配结构 L型 T型 耦合T型 CS跨导增强 极点调控 极点调控 耦合谐振腔 耦合谐振腔 频率(GHz) 101.5~142.1 70~140 22~47 54.4~90.0 62.5~92.5 24.9~32.5 68.1~96.4 24.0~32.5 增益(dB) 20.6 25 22.2 17.7 18.5 18.33 29.6 22.1 噪声系数(dB) 6.2 <9 3.0~4.3 5.4~7.4 5.5~7.9 3.25~4.20 6.4~8.2 <5 功耗(mW) 45 54 9.5 19 27 20.5 31.3 19.3 面积(mm2) 0.225 0.33 0.13 0.37 0.24 0.38 0.27 0.12 表 2 宽带、高功率毫米波功率放大器性能对比
文献序号 [46] [47] [55] [56] [58] [60] [62] 工艺 0.13 μm
SiGe BiCMOS45 nm
CMOS SOI45 nm
CMOS SOI100 nm
AlGaN/GaN0.13 μm
SiGe BiCMOS45 nm
CMOS SOI40 nm
CMOS结构 变压器Doherty
合成变压器谐波
调谐网络4重堆叠 Wilkinson
4路合成1/4波长线
16路合成零度合成器
24路合成串并联变压器
2路合成频率(GHz) 23.3~39.4 23~40.5 29 92 68~91 60 70.3~85.5 电源电压(V) 1.5 2 5 18 1.8 2.2 0.9 Psat(dBm) 17 18.9 24.8 37.8 27.3 30.1 20.9 PAEmax(%) 22.6 43.2 29 18.3 12.4 20.8 22.3 增益(dB) 16.6~18.2 15.6~18.7 13 15.3 19.3 24.7 18.1 面积(mm2) 1.755 0.21 0.3 16.72 6.48 6.6 0.19 表 3 毫米波移相器性能对比
文献序号 [64] [65] [67] [68] [69] [70] [72] [73] 工艺 65 nm
CMOS65 nm
CMOS40 nm
CMOS0.13 μm
SiGe BiCMOS65 nm
CMOS65 nm
CMOS65 nm
CMOS40 nm
CMOS拓扑结构 开关切换 开关切换 有源无源
混合型反射型 反射型 无源矢量合成 有源矢量合成 有源矢量合成 频率(GHz) 57~64 27~42 52~57 62 29 32~40 21~30 90~98 相位精度 11.25°/5 bit 11.25°/5 bit 5.6°/6 bit 连续控制 连续控制 2.8°/12 bit 0.8°/13 bit 5.6°/9 bit 相位RMS误差(°) 4.4~9.5 3.8 3.76 – – 0.45~1.6 0.28~0.88 1.82 增益(dB) –16.3 –14.5 –19 –10.3 –8.5 –18 12.2 – 增益RMS误差(°) 0.5~1.1 2.1 2.23 – – 0.17~0.38 0.16 1.12 功耗(mW) 0 0 14.3 0 0 0 12 – 面积(mm2) 0.094 0.395 0.15 0.16 0.076 0.14 0.052 – -
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