TEM分析用的半导体横截面样品的制备和分析的结果
PREPARATION OF CROSS-SECTIONAL SPECIMEN OF SEMICONDUCTOR FOR TEM AND ANALYTICRESULTS
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摘要: 本文介绍了透射式电子显微镜(TEM)用的横截面样品的制作技术。利用这一技术制出的样品,用TEM观察到了GaAs/AlGaAs超晶格结构中周期性的精细成分调制的新现象。在金属有机化合物汽相沉积(MOCVD)生长的GaAs/si材料中还观察到一些新形状的位错、微孪晶等。这一种制样技术也适用于其他半导体材料系统的研究。Abstract: The technique for preparing cross-sectional specimen of semiconductor for TEM is shown. In such specimens prepared with the technique, an unexpected periodic compositional modulation in the fine low-dimensional structure named Fine Low Dimensional Modulated Fringes of GaAs/AlGaAs multilayers grown by MBE are observed. Some new patterns of dislocations, defects and microtwins etc. in GaAs/Si grown by both MBE and MOCVD are remarked. The technology can be adapted to the study of other systems of semiconductor materials also.
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范荣团,电子科学学刊,12(1990)1,93-99.[2]褚一鸣,姜彤弼,范荣团,电子显微学报,7(1988)3,178.[3]范荣团,MBE,MOCVD外延生长的GaAs/Si中微孪晶,第三届全国材料科学中电子显微学会议论文集,1989年,11月,四川乐山,第56-58页.[4]D. J. Eagesham, et al., Defects in MBE and MOCVD Grown GaAs on Si Inst. Phys. Conf. Ser. No.87,1987, 105-110.
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