用紫外光表面处理方法清除砷化镓表面的碳氢化合物
UV SURFACE CLEANING METHOD FOR REMOVING HYDROCARBONS FROM GaAs SURFACE
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摘要: 正 1.引言 获得一个洁净的表面对Ⅲ-Ⅴ族化合物光电阴极、薄膜科学、热压粘结、半导体外延技术以及其它现代表面工艺是至关重要的。物体表面吸附的污染物是各种各样的。最常见的是氧化物、碳氢化合物和各种气体。为了清除这些吸附物,人们曾采取多种措施,如用各种化学溶剂清洗、真空加热清洁、电子轰击、等离子体轰击以及氩离子溅射等等。这些清洁方法都各起其特有的作用。如化学溶剂和真空加热清洁方法,能
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Abstract: A simple but high-efficient UV surf ace cleaning method for removing absorbed hydrocarbons from GaAs surface is described. The analytic results of Auger spectra show that the method is very effective. -
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