电子束轰击半导体偏转调制放大器带状层流电子束的设计
DESIGN OF LAMINAR FLOW ELECTRON BEAM OF RECTAU-GULAR CROSS-SECTION FOR THE DEFLECTION MODULATED ELECTRON-BOMBARDED SEMICONDUCTOR AMPLIFIER
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摘要: 本文给出了用于电子束轰击半导体器件的带状层流电子束的设计考虑、计算机分析和实验结果。采用特殊校正透镜获得了截面为13mm2的带状层流束。校正透镜的使用对于有限宽度带状束的实现是一个重要措施,可推广应用于其他场合。
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关键词:
Abstract: This paper presents design, computer analysis and experimental result of laminar flow electron beam with rectangular cross section. The beam is used in a deflection-modulated electron-bombarded semiconductor amplifier. This kind of amplifier is a new device in microwave field developed during the last decade.Owing to employing special correcting lens, laminar flow beam with rectangular cross section of 13 mm2 is obtained. Using correcting lens to obtain rectangular beam of finite width is a useful method.This method may be applied to other fields.
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