变形电子束曝光机成形偏转器的设计和性能
DESIGN AND PERFORMANCE OF SHAPING DEFLECTORS FOR VARIABLE SHAPED ELECTRON BEAM LITHOGRAPHY
-
摘要: 在变形电子束曝光机中,为使曝光均匀必须保证靶上束斑电流密度物边缘分辨率不随束斑形状和尺寸的变化而改变。实现这一目标的关键是正确设计成形偏转器。本文讨论采用高灵敏度平行板偏转器实现成形偏转时,为达到上述目标应进行的线性补偿和旋转补偿的设计计算方法。给出了用实验方法改变电子源象与偏转板几何中心的轴向距离所测得的线性补偿因子和旋转补偿因子的值。实验结果与计算值符合较好。
-
关键词:
- 电子束曝光机; 电子光学; 偏转器
Abstract: In order to obtain uniform exrnosure in variable shaped electron beam lithography, the beam current density and edge resolution on the target must not change for different spot shapes and sizes. The key to the goal is the anpropriate design of shaping deflectors. A linear and rotation compensation approach is presented. Values of linear and rotation compensation factors versus the distances between electron source image and centers of deflectors are measured on an experimental electron beam column with variable spot shaping. The experimental results are in good agreement with the calculated ones. -
G .Cogswell et al., Proc.8th International Conference on Electron and Ion Beam science and Technology,1978,PP.117-133.[2]M. Fujinami et al., J.Vac.Sci.Technology, 19(1981),941-945.[3]R. D. Moore, et al., J.Vac.Sci.Technology, 19(1981), 950-952.[4]S. Moriya, et al., J.Vac.Sci.Technology, B1(1983),990-994.[5]K. Nakamura, et al., J.Vac.Sci.Technology, B3(1985),94-97.[6]H. K.King, et al., J.Vac. Sci. Technology, B3(1985),98-101.[7]E. de Chambost, et al., J.Vac.Sci.Technology, B4(1986), 78-82.[8]M. Fujinami, et al., J.Vac. Sci.Technology, B5(1987),61-65.[9]R.Yoshikawa,et al.,J.Vac. Sci.Technology, B5(1987),70-73.[10]S.Tamamushi, et al., J.Vac Sci.Technology, B6(1988),209-212.[11]H .C. Pfeiffer, J.Vac. Sci. Technology, 15(1978),887-890.[12]江钧基,电子科学学刊, 8(1986),359-366. -
计量
- 文章访问数: 2016
- HTML全文浏览量: 85
- PDF下载量: 515
- 被引次数: 0
下载:
