DJ-2型可变矩形电子束曝光机电子光学设计
ELECTRON OPTICAL COLUMN FOR VARIABLE RECTANGULAR-SHAPED BEAM LITHOGRAPHY SYSTEM DJ-2
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摘要: 本文讨论可变矩形电子束曝光机的电子光学设计,着重分析光路构成和变形偏转补偿等问题。DJ-2型机使用最少的透镜数实现变形束曝光机的功能要求。为实现高速变形偏转,采用高灵敏度串接式平板静电偏转器,通过精确的线性补偿和旋转补偿,使靶上束斑电流密度和分辨率以及原点位置不受束斑尺寸改变的影响。实验结果表明,用发夹型钨丝阴极时的束流密度大于0.4A/cm2;22mm扫描场内边缘分辨率优于0.2m。
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关键词:
- 电子光学; 电子束曝光机; 可变矩形束
Abstract: The electron optical column for variable rectangular-shaped beam lithography system DJ-2 is described, with emphasis on the analysis of optical configuration and shaping deflection compensation. In this column the variable spot shaping is performed with a minimum number of lenses by a more reasonable optical scheme. A high-sensitivity electrostatic shaping deflector with serial parallel-plates is employed for high-speed spot shaping. With the accurate linear and rotational approaches, the spot current density of over 0.4 A/cm2 is obtained, with a tungsten hairpin cathode, and the edge resolution is better than 0.2 m within 2 X 2 mm field size. -
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