平行板偏转系统的几何象差和优化设计
GEOMETRIC ABERRATIONS AND OPTIMUM DESIGN OF AN ELECTROSTATIC DEFLECTION SYSTEM CONSISTING OF PARALLEL PLANAR CONDENSERS
-
摘要: 本文从理想均匀静电场偏转系统三级几何象差的公式出发,导出了由两对互相垂直的偏转板组成的平行平板偏转系统的三级几何象差公式。这些公式不但可用来快速估算偏转象差,还可用来作为校验数字计算程序的理论模型。从水平和垂直方向偏转象散和场曲的影响应相同这一要求出发,提出了一种优化设计方法。在给定偏转区总长度和两对偏转板之间的距离后,可以计算出每对偏转板的最佳长度。文中给出了设计数表,并比较了平行平板偏转系统和八极偏转系统的优缺点。
-
关键词:
- 静电偏转; 几何象差; 优化设计
Abstract: Formulae of the third order geometric aberrations caused by the pirallcl planar deflection systems consisting of two planar deflectors disposed sequentially and orthogonally have been derived. These formulae can be used as an analytic solution for quickly estimating the geometric aberrations of a known deflection system and checking the related computer program. In view of attaining minimum and equal deflection aberration on the horizontal and vertical sides of a square scanning area, a method of optimum design is proposed. When the total length of the deflection region and the distance between the two deflectors are given, the optimum length of each of the two deflectors can be calculated by this method. -
R. D. Moore, G. A. Caccoma, H. C. Pfeiffer, et al., A High Throughput, High Resolution e-Beam Litho-[2]graphy Tool, Proc. of the 16th Symp. on Electron, Ion and Photon Beam Technology, Dallas, Taxas, May 26-29, 1981, pp. 950-952.[3]J. Kelly, T. Groves, H. P, Kuo, A High-Current, High Speed Electron Beam Lithography Column, Proc. of the 16th Symp. on Electron, Ion, and Photon Beam Technology, Dallas, Taxas, May 26-29, pp.936-[4]940.[5]G, Cogswell, S. Mlyauchi, K. Tanaka, N. Goto, Electron Beam Lithography System with variable-Speed Electron Beam, Proe. 8th Int. Symp. Electron and Ion Beam Soci. Technol., Beijing, 1978, pp. 117-133.[6]江钧基, 电子科学学刊, 8(986), 359-366. -
计量
- 文章访问数: 1851
- HTML全文浏览量: 108
- PDF下载量: 531
- 被引次数: 0
下载:
