浸没流多透镜多注电子光学系统的模拟研究

张瑞; 王勇; 谢敬新

doi:10.3724/SP.J.1146.2008.00799

浸没流多透镜多注电子光学系统的模拟研究

doi: 10.3724/SP.J.1146.2008.00799

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出版历程
- 收稿日期: 2008-06-23
- 修回日期: 2009-03-11
- 刊出日期: 2009-07-19

Simulation Study of the Confined-Flow Multi-lenses Multi-beam Electron-Optical System

摘要

摘要: 该文采用先2维后3维的计算方法，对L波段高峰值功率多注速调管电子光学系统进行了模拟设计。采用均匀场浸没流多透镜聚焦系统对电子注进行聚焦，获得了通过率100%，填充因子55%，特性良好的旁轴电子注。模拟计算表明，多透镜系统可有效调整电子注平衡半径，电子枪区均匀场可有效调整电子注波动性及层流性，聚集系统可在阴极磁感应强度为0.001~0.01 T，主磁场为0.06~0.13 T的范围内实现对旁轴电子注的良好聚焦。
- 电子光学系统;多注速调管;电子枪;电子注
Abstract: The electron-optical system of an L-band multi-beam klystron is designed. The 2-D simulation for the system is conducted first and the 3-D simulation is done in succession. Confined-flow uniform magnetic fields focusing system with multi-lenses is adopted and the paraxial beams with perfect characteristic are obtained. Simulation indicates that the beam occupancy rate is about 55%, the beam transmission rate is 100%, the multi-lenses system can modulate the beam equilibrium radius effectively and the uniform magnetic field in gun region can modulate the beam trajectories. The focusing system allows matching beams with the magnetic fields on the cathode range from 0.001 T to 0.01 T and the magnetic fields in main region range from 0.06 T to 0.13 T.

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