耗尽型选择性掺杂异质结晶体管
DEPLETION MODE SELECTIVE DOPED HETEROJUNCTION TRANSISTOR
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摘要: 设计和研制了耗尽型选择性掺杂异质结晶体管。外延选择性掺杂材料是由本所Fs-Ⅲ型分子束外延炉生长的。制作器件的材料在室温下,霍尔测量的电子迁移率为6500cm2/vs,二维薄层电子浓度ns=91011cm2。在77K时n=75000cm2/vs。测量了具有栅长1.21.5m,栅宽2180m耗尽型异质结器件的直流特性和器件的跨导,室温下gm=110~130ms/mm,而低温77K时,可达到200ms/mm。Abstract: Depletion Model Selective doped heterojunction transistor is designed and fabricated. Epitaxial modulation loping material were grown by a home-made MBE system. The gate length and width for low noise depletion devices were 1.2-1.5m and 2180m respecipely. The electron mobility of the material is typically 6500cm2/v.s at 300K and 75000 cm2/v.s at 77 K. The sheet electron concentration n, is 91011 cm-2. The transconductance of the depletion Mode levices is 100-130 ms/mm at room temperature. However at low temperature the transconductance is 200 ms/mm.Its noise figure is above 2-3dB.
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Paul M. Solomon, Hadis Morkoc, IEEE Trans. on ED, ED-31(1984)8, 1015.
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