VHDL高级综合中的多目标工艺映射方法
A METHODOLOGY OF TECHNOLOGY MAPPING FOR MULTI-TARGET IN VHDL HIGH LEVEL SYNTHESIS SYSTEM
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摘要: 从国内情况看,高级综合系统的目标,即后端CAD版图工具可分为两大类。一类只能接收门级网表;而另一类其单元库较为完备,往往能接收较大颗粒度的宏单元。针对这种情况,本文研究高级综合结果与后端工艺的衔接问题。提出多目标多层次工艺映射(MLTMMT)策略,旨在与多种工艺衔接。解决实现该策略的有关问题:(1)给出多目标工艺映射方法的形式化描述;(2)给出在多个层次上的多目标工艺映射方法;(3)分析研究多种工艺库,提出一种面积和延时的线性模型;(4)给出RTL通用元件集;(5)建立多种工艺VHDL模拟模型。所实现的系统已完成与三种工艺衔接,验证了本文工作。Abstract: This paper is focused on the research of connecting the HLS(High Level Synthesis) result to the technology of IC,To connect to deferent technology, a tactics of MLTMMT(Multi Level Technology Mapping for Multi-Target)is proposed, All key points are researched which include: (1)giying the formal descirption of the technology mapping for multi-target; (2)giving the method of MLTMMT; (3)analyzing and researching many technology libraries,presenting a lineal model of area and delay of the technology cells: (4)giving the set of the general RTL components; (5)building the VHDL simulation model in different technologies.The system has been connected To 3 kinds of IC prodaction line: and this verifies the theory and method.
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