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Volume 13 Issue 6
Nov.  1991
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Tan Kaisheng. PHOTOCHEMICAL CLEANING METHOD FOR THE INTERFACE[J]. Journal of Electronics & Information Technology, 1991, 13(6): 659-662.
Citation: Tan Kaisheng. PHOTOCHEMICAL CLEANING METHOD FOR THE INTERFACE[J]. Journal of Electronics & Information Technology, 1991, 13(6): 659-662.

PHOTOCHEMICAL CLEANING METHOD FOR THE INTERFACE

  • Received Date: 1990-06-07
  • Rev Recd Date: 1991-02-25
  • Publish Date: 1991-11-19
  • An experiment of cleaning the organic molecules absorbed on the interface with photochemical method is described. The mechanism, the experimental method and the AES results are given. The results show that the photosensitized oxidation process of UV/O3 for the organic molecules is effective not only for the surface but also for the interface of substances.
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  • J. A. McKintock et al., J. Vac. Sci.Techn., 20(1982), 241-242.[2]谈凯声,李建平,电子科学学刊,8(1986),155-158.[3]J. R. Vig et al., Surface Studies for Quartz Resonators, in Proc. 28th Annu. Symp. on Frequency Control; U. S. Army Electronics Command Ft. Monmouth. N. J., AD 011113, (1974), pp. 96-108.[4]R. D. Peter, Ceramic flatpack enclosures for precision crystal units, in Proc. of the 30th Anon. Symp. on Frequency Control, (1976), pp. 224-231.[5]谈凯声,李建平,真空科学与技术,6(1986),42-50.[6]谈凯声,祈宜芝,半导体学报,10(1989),236-240.[7]谈凯声,半导体学报,11(1990),301-304.[8]R. R. Sowell et al., J. Vac. Sci. Techn, 11(1974), 474-475.[9]V. N. Filimonov, Investigation of Sensitized Photooxidation of adsorbed Spectroscopy, in Elementary Phato-[10]processes in Molecules (B. S. Neporent, ed.), Consultants Bureau, New York, (1968), pp. 248-259.
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