DEVELOPMENT OF HIGH-PRECISION REGULATED POWER SUPPLY WITH 30kV HIGH VOLTAGE

A high-precision regulated power supply for a new type electron beam lithography system with 30 kV high voltage is recommended. The design scheme of double closed loop regulation and the design scheme of centralized compensation combined with dispersed compensation are adopted. In accordance with the technical requirements of regulated power supply, some key technigues have been properly handled. All it s qualifications satisfy or exceed the original design requirements.