CALCULATION FOR GEOMETRICAL ABERRATIONS OF A DEFLECTION SYSTEM WITH A UNIFORM ELECTROSTATIC FIELD

Jiang Junji

Volume 8 Issue 5

Sep. 1986

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Jiang Junji . CALCULATION FOR GEOMETRICAL ABERRATIONS OF A DEFLECTION SYSTEM WITH A UNIFORM ELECTROSTATIC FIELD[J]. Journal of Electronics & Information Technology, 1986, 8(5): 359-366.

Citation:

Jiang Junji . CALCULATION FOR GEOMETRICAL ABERRATIONS OF A DEFLECTION SYSTEM WITH A UNIFORM ELECTROSTATIC FIELD[J]. Journal of Electronics & Information Technology, 1986, 8(5): 359-366.

Jiang Junji . CALCULATION FOR GEOMETRICAL ABERRATIONS OF A DEFLECTION SYSTEM WITH A UNIFORM ELECTROSTATIC FIELD[J]. Journal of Electronics & Information Technology, 1986, 8(5): 359-366.

Citation:

Jiang Junji . CALCULATION FOR GEOMETRICAL ABERRATIONS OF A DEFLECTION SYSTEM WITH A UNIFORM ELECTROSTATIC FIELD[J]. Journal of Electronics & Information Technology, 1986, 8(5): 359-366.

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CALCULATION FOR GEOMETRICAL ABERRATIONS OF A DEFLECTION SYSTEM WITH A UNIFORM ELECTROSTATIC FIELD

Jiang Junji

Received Date: 1984-11-19
Rev Recd Date: 1985-03-28
Publish Date: 1986-09-19

Abstract

Abstract

In this paper, formulas of third geometrical deflection aberratios for an ideal uniform electrostatic field are deritved by solving the motion equations of an electron passing through this field. The results can be used not only to estimate the distortion, astigamatism and field curvature, and coma produced by a Gaussian or shaped electron beam, but also to set the original size of the deflector and determine the effect caused by the misaligument between the electron beam and the deflector. Some mistakes in Sturrock's paper (1955) are also poited out.

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References(1)

References

J. Kelly, T, Groves and H. P. Kuo, A High-Current, High Specd Electron Beam Lithography Column, Proceedings of the 16th Symposium on Electron, Ion, and Photon Beam Technology, Dallas,Texas, May 26-29, 1981, p. 936.[2] H. C. Chu and E. Munro, Computational Techniques for Designing Electron Beam Lithography System Containing Any Combination of Electrostatic and Magnetic Lenses and Deflectors, Proceedings of the 6th International Conference on Microlithography, Delft University, Amsterdam 1981, p. 19.[3] P. A. Sturrock, Static and Dynamic Electron Optics, Cambridge University Press, 1955, p. 146.[2]Hilary Moss, Narrow Angle Electron Guns and Cathode Ray Tubes, Academic Press, New York, 1968.[3]西门纪业,电子和离子光学原理及象差导论,科学出版社,1983, p.49.

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