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Volume 21 Issue 5
Sep.  1999
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Hai Yuhan, Hai Hao, Xi Zhonghe, Zhang Qiang. INVESTIGATION OF CHARGE INTENSIFICATION EFFECT IN a-Si:H BY MEANS OF PHOTOELECTRIC SENSITIVITY METHOD[J]. Journal of Electronics & Information Technology, 1999, 21(5): 686-691.
Citation: Hai Yuhan, Hai Hao, Xi Zhonghe, Zhang Qiang. INVESTIGATION OF CHARGE INTENSIFICATION EFFECT IN a-Si:H BY MEANS OF PHOTOELECTRIC SENSITIVITY METHOD[J]. Journal of Electronics & Information Technology, 1999, 21(5): 686-691.

INVESTIGATION OF CHARGE INTENSIFICATION EFFECT IN a-Si:H BY MEANS OF PHOTOELECTRIC SENSITIVITY METHOD

  • Received Date: 1997-04-29
  • Rev Recd Date: 1999-01-18
  • Publish Date: 1999-09-19
  • The photocurrent-voltage characteristics and photoelectric sensitivity of a-Si:H samples with slit and comb electrodes are measured. A method for calculating the charge intensifying gain from the photoelectric sensitivity is proposed. The obtained charge intensifying gain of a-Si:H under an electric field of 105 V/cm with this method is as high as 4.3103. The generation process of the charge intensification effect in a-Si:H is discussed on the basis of the energy level diagram. And the product of electron ...
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