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Volume 7 Issue 4
Jul.  1985
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Pang Yongxiu, Sun Bingyu. STUDY OF THE DIFFUSION OF Cd AND Zn IN InP[J]. Journal of Electronics & Information Technology, 1985, 7(4): 297-303.
Citation: Pang Yongxiu, Sun Bingyu. STUDY OF THE DIFFUSION OF Cd AND Zn IN InP[J]. Journal of Electronics & Information Technology, 1985, 7(4): 297-303.

STUDY OF THE DIFFUSION OF Cd AND Zn IN InP

  • Received Date: 1984-01-25
  • Rev Recd Date: 1985-01-29
  • Publish Date: 1985-07-19
  • Study of the diffusion of Cd and Zn into InP at temperature of 450-700℃is described. The effects of various impurity sourees, such as Cd, Zn and their compounds on the diffusion are studied in detail. Using the ratio of the square of the diffusion depth x2 and the time t as the mcasure of the diffusion velocity, a plot of x2/t versus temperature T is given. It is found that the diffusion velocity of Cd is slower, especially when CdP2 is used as diffusion source, and thus the diffusion depth and concentration of Cd are easier to be controlled. So it is a more ideal diffusion impurity source. The complicated phenomena of Cd-and Zn-diffusion in InP are explained with neutral complex proposed by Tien (1979).
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  • E.W.Williams,W.Elder, M. G. Astles, M.Webb, I. B. Mullin, B. Straughan and P. J. Tufton, J. Electrcchem. Soc., 120(1973), 1741.[2]A. G. Foyt, J. Cryst. Growth, 54(1981), 1.[3]P. K. Tien and B. I. Miller, Appl. Phys. Lett., 34(1979), 701.[4]Y. Matsushima, N. Seki, S. Akiba, Y. Noda and Y. Kushiro, Electronics Letters, 19(1983) 845.[5]Y. Takanashi and Y. Horikoshi, Jpn. J. Appl. Phys., 18(1979), 1615.[6]水海龙,张桂成,邬祥生,徐少华,胡道姗,李允平,发光与显示,1982年,第3期,第72页.[7]林兆槐,沈家树,半导体光电,1982年,第2期,第34页.[8]陈自姚,邵永富,彭瑞伍,半导体学报,3(1982),215.[9]Ken-Jchi Ohtsuka, Y. Yamazoe, T. Nishino and Y. Hamakawa, Jpn.J.Appl. Phys. 20(1981),1113.[10]N. Chand and P. A. Houston, ,Solid-State Electron., 25(1982).[11]B. Tuck and A. Hooper J. Phys. D: Appl. Phys. 8(1975), 1806.[12]逢永秀,府治平,科技通讯,1979年,第1期,第21页.[13]R. L. Longini, Solid-State Electron., 5(1962), 127.
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