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Hong Pu. A LONG PULSE LARGE AREA INTENSE ELECTRONBEAM SOURCE[J]. Journal of Electronics & Information Technology, 1981, 3(3): 185-190.
Citation: Hong Pu. A LONG PULSE LARGE AREA INTENSE ELECTRONBEAM SOURCE[J]. Journal of Electronics & Information Technology, 1981, 3(3): 185-190.

A LONG PULSE LARGE AREA INTENSE ELECTRONBEAM SOURCE

  • Received Date: 1980-02-22
  • Publish Date: 1981-07-19
  • The long pulse electron beam system reported here was constructed for transverse pumping and e-beam sustained discharge large energy gas laser. The electron beam parameters are: the beam energy about 200-250 keV, pulse duration (PWHM) about 1-3s, current density in 0.5-8 A/cm2 range and beam area 10010cm2. With this system, we have performed XeCl laser experiments and obtained laser energy output-1J in 1.9 1 active volume. Recently this system was used as a pumping source for CO2 laser, and we have preliminarily obtained 360 J laser energy in 7,85 1 active volume.
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  • Charles Coson, et al., Appl. Phys. Lett,23(1973), 110; J. C. Hsia, et al., AD-A047684.[2]洪浦,电子学通讯,2(1980), 37.[3]R. K. Parker, et al., J. Appl. Phys., 45(1974),2463.[4]的場幹史.レーザー研究,6(1978), 168.
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