长脉冲大面积强流电子束源
A LONG PULSE LARGE AREA INTENSE ELECTRONBEAM SOURCE
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摘要: 本文介绍的长脉冲大面积强流电子束系统是为横向泵浦和控制放电泵浦大能量气体激光而设计和研制的。电子束能量为200250keV,脉宽约为13s,电流密度在0.58A/cm2范围内可调,束截面积约为10010cm2。用这台电子束系统已成功地进行控制放电泵浦XeCl激光,在1.91的激活体积中获得激光能量为1J。今年又用它作为CO2激光的泵浦源,在7.851的体积内初步获得360J的激光能量。
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关键词:
Abstract: The long pulse electron beam system reported here was constructed for transverse pumping and e-beam sustained discharge large energy gas laser. The electron beam parameters are: the beam energy about 200-250 keV, pulse duration (PWHM) about 1-3s, current density in 0.5-8 A/cm2 range and beam area 10010cm2. With this system, we have performed XeCl laser experiments and obtained laser energy output-1J in 1.9 1 active volume. Recently this system was used as a pumping source for CO2 laser, and we have preliminarily obtained 360 J laser energy in 7,85 1 active volume. -
Charles Coson, et al., Appl. Phys. Lett,23(1973), 110; J. C. Hsia, et al., AD-A047684.[2]洪浦,电子学通讯,2(1980), 37.[3]R. K. Parker, et al., J. Appl. Phys., 45(1974),2463.[4]的場幹史.レーザー研究,6(1978), 168. -
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