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Volume 11 Issue 3
May  1989
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Li Guoqiang, Zhou Liwei, Jin Weiqi, Fang Erlun. AN INVERSE DESIGN OF ELECTROSTATIC FOCUSING FIELD FOR ELECTROSTATIC AND MAGNETIC IMAGING[J]. Journal of Electronics & Information Technology, 1989, 11(3): 236-243.
Citation: Li Guoqiang, Zhou Liwei, Jin Weiqi, Fang Erlun. AN INVERSE DESIGN OF ELECTROSTATIC FOCUSING FIELD FOR ELECTROSTATIC AND MAGNETIC IMAGING[J]. Journal of Electronics & Information Technology, 1989, 11(3): 236-243.

AN INVERSE DESIGN OF ELECTROSTATIC FOCUSING FIELD FOR ELECTROSTATIC AND MAGNETIC IMAGING

  • Received Date: 1987-04-29
  • Rev Recd Date: 1988-01-03
  • Publish Date: 1989-05-19
  • An inverse design of electrostatic focusing field for electrostatic and magnetic imaging is investigated. Using the potential superimposition theorem of electrosta:ic field in multi-electrode system, a mathematical model has been developed and an optimization method has been introduced into computation for designing the electrostatic focusing field of the imaging system.
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  • 周立伟,北京工业学院学报,1983年,第3期,第12-24页.[2]Zhou Liwei, Ni Guoqiang, Fang Erlun, Electrostatic and Magnetic Imaging without Image Rotation, Electron Optical Systems, SEM. Inc., 1984, pp. 37-43.[3]周立伟,倪国强,方二伦,电子学报,1984年,第3期,第33-44页.[4]Zhou Liwei, Qiu Baicang, Ni Guoqiang, 将发表于Optik 78(1988)2, 54-58.[5]W. Glaser, Z. Phys., 116 (1946), 19-33.[6]K. Siegbahn, Phil. Mag., 37 (1946), 162-184.[7]Г.А.Гринберг Избранные Вопросы Математической Теорин Элеских и Магмитных Явлений Изд.АН.СССР.,1948,рр.507-535.[8]周立伟,潘顺臣,艾克聪,北京工业学院学报,1983年,第1期,第1-18页.[9]P. W. Hawkes, Optik, 38 (1973), 589-591.[10]M. Szilagyi, Optik, 50 (1978), 35-51.[11]M. Szilagyi, Synthesis of Electron Lenses, Electron Optical Systems, SEM. Inc., 1984, pp. 75-84.[12]H. Rose, R. W. Moses, Optik, 37 (1978), 316-336.[13]周立伟,兵工学报,1979年,第1期,第66-79页.[14]О.И.谢曼著,楼格译,电子光学理论基础,高等教育出版社,1958年,第125-127页.[15]周立伟,史万宏等,两电极双曲场作为静电聚焦成象系统的电子光学,第三次全国电子光学学术讨论会,(咸阳),1989年.
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