Fan Rongtuan. PREPARATION OF CROSS-SECTIONAL SPECIMEN OF SEMICONDUCTOR FOR TEM AND ANALYTICRESULTS[J]. Journal of Electronics & Information Technology, 1990, 12(6): 656-659.
Citation:
Fan Rongtuan. PREPARATION OF CROSS-SECTIONAL SPECIMEN OF SEMICONDUCTOR FOR TEM AND ANALYTICRESULTS[J]. Journal of Electronics & Information Technology, 1990, 12(6): 656-659.
Fan Rongtuan. PREPARATION OF CROSS-SECTIONAL SPECIMEN OF SEMICONDUCTOR FOR TEM AND ANALYTICRESULTS[J]. Journal of Electronics & Information Technology, 1990, 12(6): 656-659.
Citation:
Fan Rongtuan. PREPARATION OF CROSS-SECTIONAL SPECIMEN OF SEMICONDUCTOR FOR TEM AND ANALYTICRESULTS[J]. Journal of Electronics & Information Technology, 1990, 12(6): 656-659.
The technique for preparing cross-sectional specimen of semiconductor for TEM is shown. In such specimens prepared with the technique, an unexpected periodic compositional modulation in the fine low-dimensional structure named Fine Low Dimensional Modulated Fringes of GaAs/AlGaAs multilayers grown by MBE are observed. Some new patterns of dislocations, defects and microtwins etc. in GaAs/Si grown by both MBE and MOCVD are remarked. The technology can be adapted to the study of other systems of semiconductor materials also.
范荣团,电子科学学刊,12(1990)1,93-99.[2]褚一鸣,姜彤弼,范荣团,电子显微学报,7(1988)3,178.[3]范荣团,MBE,MOCVD外延生长的GaAs/Si中微孪晶,第三届全国材料科学中电子显微学会议论文集,1989年,11月,四川乐山,第56-58页.[4]D. J. Eagesham, et al., Defects in MBE and MOCVD Grown GaAs on Si Inst. Phys. Conf. Ser. No.87,1987, 105-110.