POLYMETHYLMETHACRYLATE LANGMUIR BLODGETT FILMS FOR HIGH RESOLUTION ELECTRON BEAM RESIST

Lu Wu; Gu Ning; Wei Yu; Shen Haoying; Zhang Lan

Volume 16 Issue 6

Nov. 1994

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Article Navigation > Journal of Electronics & Information Technology > 1994 > 16(6): 651-654

Lu Wu, Gu Ning, Wei Yu, Shen Haoying, Zhang Lan. POLYMETHYLMETHACRYLATE LANGMUIR BLODGETT FILMS FOR HIGH RESOLUTION ELECTRON BEAM RESIST[J]. Journal of Electronics & Information Technology, 1994, 16(6): 651-654.

Citation:

Lu Wu, Gu Ning, Wei Yu, Shen Haoying, Zhang Lan. POLYMETHYLMETHACRYLATE LANGMUIR BLODGETT FILMS FOR HIGH RESOLUTION ELECTRON BEAM RESIST[J]. Journal of Electronics & Information Technology, 1994, 16(6): 651-654.

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POLYMETHYLMETHACRYLATE LANGMUIR BLODGETT FILMS FOR HIGH RESOLUTION ELECTRON BEAM RESIST

Received Date: 1993-06-07
Rev Recd Date: 1994-02-14
Publish Date: 1994-11-19

Abstract

Abstract

Ultra-thin (20-100nm) polymethylmethacrylate (PMMA) films prepared by Langmuir-Blodgett techniques have been explored as high resolution electron beam resists. A Hitachi S-450 scanning electron microscope (SEM) has been refitted for a high resolution electron beam exposure system. The lithographic properties and exposure conditions of LB PMMA films were investigated. 0.15um lines-and-spaces patterns were achieved by using the SEM as the exposure tool. The results demonstrate that the etch resistance of such films is sufficiently good to allow patterning of a 20-nm aluminum film suitable for mask fabrication.

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References(1)

References

Bowden M J. Solid State Technol., 1981, 24(1): 73-79.[2]Barraud A. Thin Solid Films, 1983, 99(2): 317-321.[3]Broers A B, Pomerantz M. Thin Solid Films, 1983, 99(2): 323-329.[4]Kuan S W J, Frank C W, Yenlee Y H, et al. J. Vac[J].Sci Technol. .1989, 7(6):1745-1750[5]Miyashita T, Matsuda M. Thin Solid Films, 1989, 168(1): L47-L49.[6]Stroeve P, Srinnivasan M P, Higgins B G, et al. Thin Solid Films, 1987, 146(1): 209-220.[7]Knan S W J, Frank C W, Fu C C, et al. J. Vac[J].Sci. Teehnol. B.1988, 6(6):2274-2279[8]鲁武,顾宁,沈浩赢,等.东南大学学报,1994,24(1): 117-119.

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