RESEARCH ON MICROWAVE PLASMA SOURCE

Wu Jinfa; Zhang Erli; Zhen Hansheng; Guan Zuoyao

Volume 9 Issue 5

Sep. 1987

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Article Navigation > Journal of Electronics & Information Technology > 1987 > 9(5): 458-464

Wu Jinfa, Zhang Erli, Zhen Hansheng, Guan Zuoyao. RESEARCH ON MICROWAVE PLASMA SOURCE[J]. Journal of Electronics & Information Technology, 1987, 9(5): 458-464.

Citation:

Wu Jinfa, Zhang Erli, Zhen Hansheng, Guan Zuoyao. RESEARCH ON MICROWAVE PLASMA SOURCE[J]. Journal of Electronics & Information Technology, 1987, 9(5): 458-464.

Wu Jinfa, Zhang Erli, Zhen Hansheng, Guan Zuoyao. RESEARCH ON MICROWAVE PLASMA SOURCE[J]. Journal of Electronics & Information Technology, 1987, 9(5): 458-464.

Citation:

Wu Jinfa, Zhang Erli, Zhen Hansheng, Guan Zuoyao. RESEARCH ON MICROWAVE PLASMA SOURCE[J]. Journal of Electronics & Information Technology, 1987, 9(5): 458-464.

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RESEARCH ON MICROWAVE PLASMA SOURCE

Received Date: 1985-10-08
Rev Recd Date: 1900-01-01
Publish Date: 1987-09-19

Abstract

Abstract

Using the priciple of electron cyclotron resonance, the microwave plasma with high degree of ionization and activity is obtained under the lower pressure from 10-3 to 10-4 Pa. In this paper, the influences of the microwave input power and gas pressures on the parameters of plasma in nitrogen and argon are studied with Langmuir probe, and mass spectrographic analysis is also made.

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References(1)

References

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