Li Tixing, Zhang Qi, Tang Hongfang, Wang De-an, Xia Nengqiao, Zheng Baohong. A COMPACT HIGH REPETITION RATE ELEC- TRON BEAM ACCELERATOR WITH WIP ELECTRON GUN[J]. Journal of Electronics & Information Technology, 1994, 16(5): 534-540.
Citation:
Li Tixing, Zhang Qi, Tang Hongfang, Wang De-an, Xia Nengqiao, Zheng Baohong. A COMPACT HIGH REPETITION RATE ELEC- TRON BEAM ACCELERATOR WITH WIP ELECTRON GUN[J]. Journal of Electronics & Information Technology, 1994, 16(5): 534-540.
Li Tixing, Zhang Qi, Tang Hongfang, Wang De-an, Xia Nengqiao, Zheng Baohong. A COMPACT HIGH REPETITION RATE ELEC- TRON BEAM ACCELERATOR WITH WIP ELECTRON GUN[J]. Journal of Electronics & Information Technology, 1994, 16(5): 534-540.
Citation:
Li Tixing, Zhang Qi, Tang Hongfang, Wang De-an, Xia Nengqiao, Zheng Baohong. A COMPACT HIGH REPETITION RATE ELEC- TRON BEAM ACCELERATOR WITH WIP ELECTRON GUN[J]. Journal of Electronics & Information Technology, 1994, 16(5): 534-540.
The development of a compact high repetition rate electron beam accelerator is reported. The specifications of the device are output electron energy 120--150keV, beam current 5--50A, pulse duration 1 s, beam cross-section 550cm2 and repetition frequence 100Hz. The key part of the accelerator is a wire-ion-pla-sma (WIP) electron gun of particular advantage. The principle of operation of the WIP electron gun and its physical properties are described. The caculation formula of output parameter is given and preliminary experimental results are presented.
李悌兴,张奇,等.新型低能电子加速器--WIP电子枪.全国第三届高功率粒子束专业学术交流会论文报告集,I.加速器技术,河北承德:1988,9.5-9.10.[2]Wakalopulos G, Conti D K. Wire-Ion-Plasma(WIP): A Revolutionary New Technology for E-Beam Curing. Paper FC83-628, Proc. of Finishing83 Conl. Cincinnati, OH, USA: October[3]-13, 1983, 6.19-6.36.[4]Clark Jr W M, Dunning G J. IEEE J. of QE, 1978, QE-14(2): 126-129.[5]Wakalopulos G. High Peak Power Pulsed WIP Electron Gun. LLNLUCRL-13950. Livermore, CA: 1978, 1-30.[6]Digache D, Bonnet J, David D. A Short Pulse Secondary Emission Electron Gun for High Pressure Gas Lasers and Plasma Chemical Reactors. in Sixteenth ICPIG. Dusseldorf: 1983, 782-783.[7]McClure G W. Appl. Phys. Lett. 1963, 2(12): 233-234.
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