Ju Xin, Yang Jianhong. STUDY ON THE PARTICLE SIZE EFFECT OF Ta DOPED Ru-BASE THICK FILM RESISTOR[J]. Journal of Electronics & Information Technology, 1995, 17(2): 215-219.
Citation:
Ju Xin, Yang Jianhong. STUDY ON THE PARTICLE SIZE EFFECT OF Ta DOPED Ru-BASE THICK FILM RESISTOR[J]. Journal of Electronics & Information Technology, 1995, 17(2): 215-219.
Ju Xin, Yang Jianhong. STUDY ON THE PARTICLE SIZE EFFECT OF Ta DOPED Ru-BASE THICK FILM RESISTOR[J]. Journal of Electronics & Information Technology, 1995, 17(2): 215-219.
Citation:
Ju Xin, Yang Jianhong. STUDY ON THE PARTICLE SIZE EFFECT OF Ta DOPED Ru-BASE THICK FILM RESISTOR[J]. Journal of Electronics & Information Technology, 1995, 17(2): 215-219.
This paper reports the particle size effect on the resistance and TCR of Ta-doped Ru-base thick film resistor, which occurs when the particle sizes of two phases reach critical values (conductive phase 25nm, glass phase 50nm). And it can be explained qualitatively with the conduction mechanism of thick film resistor.
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