DESIGN AND PERFORMANCE OF SHAPING DEFLECTORS FOR VARIABLE SHAPED ELECTRON BEAM LITHOGRAPHY

Kang Niankan; Jiang Junji; Wu Wei; Huang Lanyou; Wu Mingjun

Volume 12 Issue 2

Mar. 1990

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Article Navigation > Journal of Electronics & Information Technology > 1990 > 12(2): 161-168

Kang Niankan, Jiang Junji, Wu Wei, Huang Lanyou, Wu Mingjun. DESIGN AND PERFORMANCE OF SHAPING DEFLECTORS FOR VARIABLE SHAPED ELECTRON BEAM LITHOGRAPHY[J]. Journal of Electronics & Information Technology, 1990, 12(2): 161-168.

Citation:

Kang Niankan, Jiang Junji, Wu Wei, Huang Lanyou, Wu Mingjun. DESIGN AND PERFORMANCE OF SHAPING DEFLECTORS FOR VARIABLE SHAPED ELECTRON BEAM LITHOGRAPHY[J]. Journal of Electronics & Information Technology, 1990, 12(2): 161-168.

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DESIGN AND PERFORMANCE OF SHAPING DEFLECTORS FOR VARIABLE SHAPED ELECTRON BEAM LITHOGRAPHY

Received Date: 1988-12-28
Rev Recd Date: 1989-10-31
Publish Date: 1990-03-19

Abstract

Abstract

In order to obtain uniform exrnosure in variable shaped electron beam lithography, the beam current density and edge resolution on the target must not change for different spot shapes and sizes. The key to the goal is the anpropriate design of shaping deflectors. A linear and rotation compensation approach is presented. Values of linear and rotation compensation factors versus the distances between electron source image and centers of deflectors are measured on an experimental electron beam column with variable spot shaping. The experimental results are in good agreement with the calculated ones.

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References(1)

References

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