Advanced Search
Volume 9 Issue 3
May  1987
Turn off MathJax
Article Contents
Chen Kaimao, Wang Zhongan. DEEP LEVELS RELATED TO COPPER IN SILICON[J]. Journal of Electronics & Information Technology, 1987, 9(3): 256-263.
Citation: Chen Kaimao, Wang Zhongan. DEEP LEVELS RELATED TO COPPER IN SILICON[J]. Journal of Electronics & Information Technology, 1987, 9(3): 256-263.

DEEP LEVELS RELATED TO COPPER IN SILICON

  • Received Date: 1985-05-13
  • Rev Recd Date: 1985-07-30
  • Publish Date: 1987-05-19
  • The energy positions and carrier capture cross-sections of the deep levels related to copper in silicon are measured by DLTS. The annealing behaviour and spatial distributions of some of these levels are studied at the same time. The results show that there are not any triple acceptor or quadruple state corresponding to substimtional copper in silicon, which have been reported in the literature. Most of the deep levels related to copper in silicon are corresponding to complexes of copper and defects in silicon.
  • loading
  • R. N. Hall and J. H. Racette, J. Appl. Phys., 35(1964), 379.[2]J. W. Chen and A. G. Milnes, Ann. Rev. Mater. Sci., 10(1980), 157.[3]A. M. Salma, J. Electrochem. Soc., 126(1979), 114.[4]C. S. Fuller and J. C. Severins, Phys. Rev., 96(1954), 21.[5]C. J. Gallagher, J. Phys. Chem. Solids, 3(1957), 82.[6]C. B. Collins and R. O. Carlson, Phys. Rev., 108(1957), 1409.[7]T. Nakano and Y. Inuishi, J. Phys. Soc. Jpn, 19(1964), 851.[8]A. G. Milnes, Deep Impurities in Semiconductors, p. 14, Wiley, New York, (1973).[9]A. A. Lebedev and M. M. Akhmedova, Sov. Phys. Semicond., 10(1976), 1130.[10]M. M. Akhmedova, L. S. Berman, L. S. Kostina and A. A. Lebedev, ibid., 10(1976), 140.[11]N. Toyama, Solid State Electron., 26(1983), 37.[12]L. C. Kimerling, J. L. Benton and J. J. Rubin, Defects and Radiation Effects in Semiconductors, 59(1980),217.[13]陈开茅,秦国刚,半导体学报,7(1986)., 298.[14]秦国刚等,半导体学报,2(1981)5, 169.[15]E. R. Weber, Appl. Phys. A, 30(1983), 1.[16]G. W. Ludwig and H. H. Woodburg, Solid State Phys., 13(1962),223.[17]W. C. Dash, Phys. Rev., 98(1955), 1536.[18]Y. Chikaura and K. Kishimoto, Jpn. J. Appl. Phys., 19(1980), L5.
  • 加载中

Catalog

    通讯作者: 陈斌, bchen63@163.com
    • 1. 

      沈阳化工大学材料科学与工程学院 沈阳 110142

    1. 本站搜索
    2. 百度学术搜索
    3. 万方数据库搜索
    4. CNKI搜索

    Article Metrics

    Article views (2178) PDF downloads(364) Cited by()
    Proportional views
    Related

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return