ELECTRON OPTICAL COLUMN FOR VARIABLE RECTANGULAR-SHAPED BEAM LITHOGRAPHY SYSTEM DJ-2

Kang Niankan

Volume 14 Issue 2

Mar. 1992

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Article Navigation > Journal of Electronics & Information Technology > 1992 > 14(2): 176-183

Kang Niankan. ELECTRON OPTICAL COLUMN FOR VARIABLE RECTANGULAR-SHAPED BEAM LITHOGRAPHY SYSTEM DJ-2[J]. Journal of Electronics & Information Technology, 1992, 14(2): 176-183.

Citation:

Kang Niankan. ELECTRON OPTICAL COLUMN FOR VARIABLE RECTANGULAR-SHAPED BEAM LITHOGRAPHY SYSTEM DJ-2[J]. Journal of Electronics & Information Technology, 1992, 14(2): 176-183.

Kang Niankan. ELECTRON OPTICAL COLUMN FOR VARIABLE RECTANGULAR-SHAPED BEAM LITHOGRAPHY SYSTEM DJ-2[J]. Journal of Electronics & Information Technology, 1992, 14(2): 176-183.

Citation:

Kang Niankan. ELECTRON OPTICAL COLUMN FOR VARIABLE RECTANGULAR-SHAPED BEAM LITHOGRAPHY SYSTEM DJ-2[J]. Journal of Electronics & Information Technology, 1992, 14(2): 176-183.

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ELECTRON OPTICAL COLUMN FOR VARIABLE RECTANGULAR-SHAPED BEAM LITHOGRAPHY SYSTEM DJ-2

Kang Niankan

Received Date: 1991-03-30
Rev Recd Date: 1991-06-17
Publish Date: 1992-03-19

Abstract

Abstract

The electron optical column for variable rectangular-shaped beam lithography system DJ-2 is described, with emphasis on the analysis of optical configuration and shaping deflection compensation. In this column the variable spot shaping is performed with a minimum number of lenses by a more reasonable optical scheme. A high-sensitivity electrostatic shaping deflector with serial parallel-plates is employed for high-speed spot shaping. With the accurate linear and rotational approaches, the spot current density of over 0.4 A/cm2 is obtained, with a tungsten hairpin cathode, and the edge resolution is better than 0.2 m within 2 X 2 mm field size.

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References(1)

References

H. C. Pfeiffer, J. Vac. Sei. Technol., 15(1978)3, 887-890.[2]J. Trotel, J. Vac. Sci. Technol., 15(1978)3, 872-873.[3]E. Goto et al., J. Vac. Sci. Technol,, 15(1978)3, 883-886.[4]G. Cogswell et al., Electron lithography system with variable-shaped electron beam, Proc. 8th International[5]Conference on Electron and Ion Beam Science and Technology, Seattle, USA, (1978), pp. 117-133.[6]N. Saitou et al., J. Vac. Sci. Technol., 18(1981)4, 1087-1093.[7]M. Nakasuji et al., J. Vac. Sci. Technal., 19(1982)3, 872-878.[8]H. C. Chu(朱协卿) et al., Optik, 81(1982)2, 121-145.[9]A. V. Crewe, Optik, 92(1978)4, 337-346.[10]康念坎等,电子科学学刊,12(1990)2,161-168.[11]N. Saitou et al., J. Vac. Sci. Technol., B3(1985)1, 98-101.[12]R. D. Mooore et al., J. Vac. Set. Technol., 18(1981)4, 950-952.

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