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Volume 11 Issue 3
May  1989
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Jiang Junji. GEOMETRIC ABERRATIONS AND OPTIMUM DESIGN OF AN ELECTROSTATIC DEFLECTION SYSTEM CONSISTING OF PARALLEL PLANAR CONDENSERS[J]. Journal of Electronics & Information Technology, 1989, 11(3): 225-235.
Citation: Jiang Junji. GEOMETRIC ABERRATIONS AND OPTIMUM DESIGN OF AN ELECTROSTATIC DEFLECTION SYSTEM CONSISTING OF PARALLEL PLANAR CONDENSERS[J]. Journal of Electronics & Information Technology, 1989, 11(3): 225-235.

GEOMETRIC ABERRATIONS AND OPTIMUM DESIGN OF AN ELECTROSTATIC DEFLECTION SYSTEM CONSISTING OF PARALLEL PLANAR CONDENSERS

  • Received Date: 1988-04-28
  • Rev Recd Date: 1988-06-30
  • Publish Date: 1989-05-19
  • Formulae of the third order geometric aberrations caused by the pirallcl planar deflection systems consisting of two planar deflectors disposed sequentially and orthogonally have been derived. These formulae can be used as an analytic solution for quickly estimating the geometric aberrations of a known deflection system and checking the related computer program. In view of attaining minimum and equal deflection aberration on the horizontal and vertical sides of a square scanning area, a method of optimum design is proposed. When the total length of the deflection region and the distance between the two deflectors are given, the optimum length of each of the two deflectors can be calculated by this method.
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  • R. D. Moore, G. A. Caccoma, H. C. Pfeiffer, et al., A High Throughput, High Resolution e-Beam Litho-[2]graphy Tool, Proc. of the 16th Symp. on Electron, Ion and Photon Beam Technology, Dallas, Taxas, May 26-29, 1981, pp. 950-952.[3]J. Kelly, T. Groves, H. P, Kuo, A High-Current, High Speed Electron Beam Lithography Column, Proc. of the 16th Symp. on Electron, Ion, and Photon Beam Technology, Dallas, Taxas, May 26-29, pp.936-[4]940.[5]G, Cogswell, S. Mlyauchi, K. Tanaka, N. Goto, Electron Beam Lithography System with variable-Speed Electron Beam, Proe. 8th Int. Symp. Electron and Ion Beam Soci. Technol., Beijing, 1978, pp. 117-133.[6]江钧基, 电子科学学刊, 8(986), 359-366.
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