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低开关比FeFET时序控制非易失性触发器设计

杜世民 杨畅 王伦耀 张哲

杜世民, 杨畅, 王伦耀, 张哲. 低开关比FeFET时序控制非易失性触发器设计[J]. 电子与信息学报. doi: 10.11999/JEIT251059
引用本文: 杜世民, 杨畅, 王伦耀, 张哲. 低开关比FeFET时序控制非易失性触发器设计[J]. 电子与信息学报. doi: 10.11999/JEIT251059
DU Shimin, YANG Chang, WANG Lunyao, ZHANG Zhe. Design of a Timing-Controlled Non-Volatile Flip-Flop with Low-Switching-Ratio FeFET[J]. Journal of Electronics & Information Technology. doi: 10.11999/JEIT251059
Citation: DU Shimin, YANG Chang, WANG Lunyao, ZHANG Zhe. Design of a Timing-Controlled Non-Volatile Flip-Flop with Low-Switching-Ratio FeFET[J]. Journal of Electronics & Information Technology. doi: 10.11999/JEIT251059

低开关比FeFET时序控制非易失性触发器设计

doi: 10.11999/JEIT251059 cstr: 32379.14.JEIT251059
基金项目: 国家自然科学基金项目(U23A20351, 62304115);浙江省自然科学基金重点项目(LDT23F04021F04),宁波市智能家电重点实验室开放课题(20250621)
详细信息
    作者简介:

    杜世民:男,副教授,研究方向为集成电路物理设计优化和存算一体电路设计

    杨畅:男,研究生,研究方向为存算一体电路设计

    王伦耀:男,教授,研究方向为逻辑综合与优化和存算一体电路设计

    张哲:男,研究生,研究方向为集成电路物理设计优化和低功耗设计

    通讯作者:

    杜世民 dushimin@nbu.edu.cn

  • 中图分类号: TN402

Design of a Timing-Controlled Non-Volatile Flip-Flop with Low-Switching-Ratio FeFET

Funds: National Natural Science Foundation of China (U23A20351, 62304115), Natural Science Foundation of Zhejiang Province (LDT23F04021F04), Open Project of Ningbo Key Laboratory of Intelligent Home Appliances (20250621)
  • 摘要: 基于铁电场效应晶体管(FeFET)的非易失性触发器(NVFF)具有高效、快速数据备份与恢复能力,是提升非易失性处理器(NVPs)性能的有效途径。然而,研究表明,FeFET开关比降低时,传统单端结构触发器在断电恢复过程中易受锁存器内部MOS管竞争影响,导致FeFET存储状态改变,造成数据恢复失败。为解决这一问题,该文提出一种面向静态无争用单相时钟触发器(SSCFF)的单端恢复电路。该结构在CLK=0时保持FeFET写入节点维持高电平,从源头避免竞争导致FeFET存储状态改变;同时提出“预充电–状态调控放电”双阶段恢复机制,实现断电前数据精准恢复。实验结果表明,该方案在FeFET开关比降至102条件下,经过2000次蒙特卡洛仿真仍能保持100 %恢复率,较现有单端结构所需开关比降低两个数量级。此外,该设计在维持飞焦耳(fJ)量级恢复功耗下,最坏保持时间减少64.6 %,时钟至输出延迟降低33.9 %。
  • 图  1  FeFET的基本结构与极化状态

    图  2  FeFET等效电路与滞回曲线

    图  3  铁电触发器电路图

    图  4  FeFET-SSCFF电路结构与恢复阶段部分电路状态图

    图  5  FeFET-SSCFF工作时序图

    图  6  节点n1n2在恢复阶段的电压变化

    图  7  基于FeFET的铁电触发器在计数器中的应用

    图  8  基于铁电触发器的RISC-V设计

    图  9  正常模式下时序指标随电源电压(VDD)变化趋势

    图  10  功耗变化趋势

    图  11  恢复模式下指标变化趋势

    表  1  FeFET部分模拟参数

    属性属性值
    宽度280 nm
    长度130 nm
    阈值电压0.4 V
    温度298 K
    阈值电压影响因子0.1 V/V
    导通电流80 μA
    关闭电流28 nA
    铁电层厚度10 nm
    下载: 导出CSV

    表  2  与相关文献的结果比较

    特性参数 RRAM-
    NVFF[28]
    FeFET-
    SAFF[2]
    FeFET-
    TGFF-1[24]
    FeFET-
    TGFF-2[11]
    FeFET-
    TGFF-3[11]
    FeFET-
    TGFF-4[25]
    FeFET-
    TGFF-5[14]
    本工作
    非易失性材质 RRAM FeFET FeFET FeFET FeFET FeFET FeFET FeFET
    工艺尺寸/nm 65 130 130 130 130 130 130 130
    额外电路 22FET+
    1RRAM
    2FeFET 2FeFET 3T+
    1FeFET
    3T+
    1FeFET
    2T+
    2FeFET
    2T+
    2FeFET
    5T+
    1FeFET
    工作模式 N/A 差分 差分 单端 单端 差分 差分 单端
    版图面积/μm2 N/A 59.64 48.21 53.51 52.35 61.84 61.84 57.97
    控制信号个数 6 0 0 1 1 0 1 2
    备份能耗/fJ 94.2 0.0 0.0 0.0 0.0 0.0 0.0 0.0
    恢复能耗(0.8V)/fJ 232.40 13.10 7.33 7.31 7.74 8.21 7.65 10.76
    Setup-Time(0.6V)/ps N/A 75 65 65 65 65 65 23
    Clock-to-Q(0.6V)/ps 164
    @1.2 V
    1164 1050 1007 995 1100 1150 760
    运行功耗(0.6V)/μW N/A 0.24 0.18 0.18 0.18 0.18 0.18 0.13
    正常模式FeFET
    所需开关比
    N/A NMOS管开关比 NMOS管开关比 NMOS管开关比 无影响 无影响 无影响 无影响
    FeFET开关比
    (3σ恢复成功率)
    N/A 110 81 1.1×104 1.1×104 110 100 14
    开关比102温度100℃ 2000次蒙特
    卡洛模拟的恢复成功率
    N/A 68 85 N/A N/A 72 74 100
    下载: 导出CSV
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出版历程
  • 收稿日期:  2025-10-09
  • 修回日期:  2026-05-15
  • 录用日期:  2026-05-15
  • 网络出版日期:  2026-06-03

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