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掺氮对类金刚石薄膜场发射的影响

马会中 张兰 姚宁 李运均 毕兆琪 王小平 张兵临 胡欢陵

马会中, 张兰, 姚宁, 李运均, 毕兆琪, 王小平, 张兵临, 胡欢陵. 掺氮对类金刚石薄膜场发射的影响[J]. 电子与信息学报, 2001, 23(11): 1246-1248.
引用本文: 马会中, 张兰, 姚宁, 李运均, 毕兆琪, 王小平, 张兵临, 胡欢陵. 掺氮对类金刚石薄膜场发射的影响[J]. 电子与信息学报, 2001, 23(11): 1246-1248.
Ma Huizhong, Zhang Lan, Yao Ning, Bi Zhaoqi, Wang Xiaoping, Li Yunjun, Zhang Binglin, Hu Huanling. THE EFFECT OF NITROGEN ADDITION ON FIELD EMISSION OF DIAMOND-LIKE CARBON FILMS[J]. Journal of Electronics & Information Technology, 2001, 23(11): 1246-1248.
Citation: Ma Huizhong, Zhang Lan, Yao Ning, Bi Zhaoqi, Wang Xiaoping, Li Yunjun, Zhang Binglin, Hu Huanling. THE EFFECT OF NITROGEN ADDITION ON FIELD EMISSION OF DIAMOND-LIKE CARBON FILMS[J]. Journal of Electronics & Information Technology, 2001, 23(11): 1246-1248.

掺氮对类金刚石薄膜场发射的影响

THE EFFECT OF NITROGEN ADDITION ON FIELD EMISSION OF DIAMOND-LIKE CARBON FILMS

  • 摘要: 利用脉冲激光沉积技术制备出了掺氮和未掺氮的类金刚石薄膜。采用X射线衍射仪、喇曼光谱仪、扫描电镜观察了掺氮和未掺氮类金刚石薄膜的微结构和表面形貌。场发射实验表明,掺氮降低了类金刚石薄膜的阈值电场,提高了发射电流密度。
  • Z. Feng, I. G. Brown, J. W. Auger, Electron emission from chemical vapor deposited diamondand amorphous carbon films observed with a simple field emission device, J. Mater. Res, 1995,10(7), 1585-1588.[2]F.Y. Chuang, C. Y. Sun, et al., Local electron field emission characteristics of pulsed laserdeposited diamondlike carbon films, Appl. Phys. Left., 1996, 69(23), 3504-3506.[3]Young Kyu Hong.[J].Ju-Jin Kim, et al., Field electron emission of diamond-like-carbon films de-posited by a laser ablation method, Techanical Digest of IVCM97, Korea.1997,:-[4]G.A.J. Amaratunga, S. R. P. Silva, Nitrogen containing hydrogenated amorphous carbon forthin-film field emission cathodes, Appl. Phys. Lett., 68(18), 1996, 2529-2531.[5]J. Chen, A. X. Wei, et al., Study of field electron emission phenomena associated with n-dopedamorphous diamond films, Journal of Vacuum Science and Technology, B16(2), 1998, 697-699.
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出版历程
  • 收稿日期:  1999-07-26
  • 修回日期:  1999-08-13
  • 刊出日期:  2001-11-19

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